| Event |
Title |
Author |
| 2005 |
| GPD |
A New Flexible Glass Coating System |
M. Andreasen |
| GPD |
A New Generation of Temperable Coatings |
M. List |
| SVC |
Flexibility and Productivity Improvements in a New Coating System Design |
P. Greene |
| GPD China |
Flexible Glass Coating Processes and Production |
S. Nadel |
| GPD China |
Flexible Glass Coating Processes and Production (Chinese version) |
S. Nadel
(translated by
Ms. Guo) |
| IGS* |
A New Generation of Flexible, Modular Production Systems for the Glass Coatings Market (*publication) |
S. Nadel |
| 2004 |
|
SVC
|
Enhancements to Rotating cylindrical Magnetrons |
J. Rietzel |
| SVC |
Plasma Emission Monitoring of Low Rate Materials on Rotating Cylindrical Magnetrons |
P Greenel |
| GPD China |
Low-E Market Development: A Comparison of the U.S., European and Chinese Markets
|
S. Nadel |
| GPD China |
Low-E Market Development: A Comparison of the U.S., European and Chinese Markets (Chinese version)
|
S. Nadel
(translated by
Ms. Guo) |
| 2003 |
| ISSP |
Sputter Deposition of Titanium Dioxide – Its Control and Enhancement
|
P. Greene |
| SVC |
High Rate Reactive Deposition of Titania from Rotating Cylindrical Magnetrons with Plasma Emission Monitoring
|
P. Greene |
| GPD |
Advanced Sputter Coating Processes for Glass: Application of Plasma Emission Control to Cylindrical Magnetrons |
S. Nadel |
| 2002 |
| SVC |
High Rate Deposition From Ceramic Targets of Titania-Based Low-Emissivity Coatings |
P. Greene |
| ICCG |
Equipment, Materials and Processes: A Review of High Rate Sputtering Technology for Glass Coating |
S. Nadel |
| 2001 |
| SVC |
Optical Properties Of Sputter Deposited Thin Silver Films |
P. Greene |
| IGR* |
High Rate Sputtering Technology for Throughput and Quality (*publication) |
S. Nadel |
| VT&C* |
Industrial Optical Coating Industry (*publication) |
R. Hill |
| GPD |
A New Generation of In-Line Volume Production Systems for Low-Defect Coating Application |
M. Perata |
| GPD |
Large Area Glass Sputtering Systems: A Global Market Outlook |
S. Nadel |
| 2000 |
| SVC |
Modeling of Production Scale Reactive Deposition of a Cylindrical Magnetron |
P. Greene |
| ICCG |
Strategies For High Rate Reactive Sputtering |
S. Nadel |
| ICCG |
Advances In Target Utilization for Planar Magnetrons |
R. Newcomb |
